Beamline |
Source* |
Areas of Research/Techniques |
Energy Range |
Operational |
1.4.1 |
Bend |
Ultraviolet photoluminescence |
1.6-6.2 eV |
Now |
1.4.2 |
Bend |
Visible and infrared Fourier transform spectroscopy
(FTIR) |
0.002-3 eV |
Now |
1.4.3 |
Bend |
Infrared spectromicroscopy |
0.05-1 eV |
Now |
3.1 |
Bend |
Diagnostic beamline |
1-2 keV |
Now |
3.3.1 |
Bend |
Commercial deep-etch x-ray lithography (LIGA) |
3-12 keV |
Now |
3.3.2 |
Bend |
Deep-etch x-ray lithography (LIGA) |
1-20 keV |
Now |
4.0.2 |
EPU5 |
Magnetic spectroscopy |
52-1900 eV |
Now |
4.2.2 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and
monochromatic protein crystallography |
6-18 keV |
2002 |
5.0.1 |
W16 |
Monochromatic protein crystallography |
12.4 keV |
Now |
5.0.2 |
W16 |
Multiple-wavelength anomalous diffraction (MAD) and
monochromatic protein crystallography |
3.5-14 keV |
Now |
5.0.3 |
W16 |
Monochromatic protein crystallography |
12.4 keV |
Now |
5.3.1 |
Bend |
Femtosecond phenomena |
1.8-12 keV |
Now |
5.3.2 |
Bend |
Polymer scanning transmission x-ray microscopy |
150-650 eV |
Now |
6.1.2 |
Bend |
High-resolution zone-plate microscopy |
300-900 eV |
Now |
6.3.1 |
Bend |
Calibration and standards, EUV/soft x-ray optics testing,
solid-state chemistry |
500-2000 eV |
Now |
6.3.2 |
Bend |
Calibration and standards; EUV optics testing; atomic,
molecular, and materials science |
50-1300 eV |
Now |
7.0.1 |
U5 |
Surface and materials science, spectromicroscopy, spin
resolution, photon-polarization dichroism |
50-1200 eV |
Now |
7.3.1.1 |
Bend |
Magnetic microscopy, spectromicroscopy |
175-1500 eV |
Now |
7.3.1.2 |
Bend |
Surface and materials science, micro x-ray photoelectron
spectroscopy |
175-1500 eV |
Now |
7.3.3 |
Bend |
X-ray microdiffraction |
6-12 keV |
Now |
8.0.1 |
U5 |
Surface and materials science, imaging photoelectron
spectroscopy, soft x-ray fluorescence |
65-1400 eV |
Now |
8.2.1 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and
monochromatic protein crystallography |
6-18 keV |
Now |
8.2.2 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and
monochromatic protein crystallography |
6-18 keV |
2002 |
8.3.1 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) and
monochromatic protein crystallography |
2.4-15 keV |
Now |
8.3.2 |
Superbend |
Tomography |
3-60 keV |
2003 |
9.0.1 |
U10 |
Coherent optics/scattering experiments |
200-800 eV |
Now |
9.0.2 |
U10 |
Chemical reaction dynamics, photochemistry, high-resolution
photoelectron and photoionization spectroscopy, photoelectron and
photoionization imaging and spectroscopy |
5-30 eV |
Now |
9.3.1 |
Bend |
Atomic, molecular, and materials science |
2.2-6 keV |
Now |
9.3.2 |
Bend |
Chemical and materials science, circular dichroism,
spin resolution |
30-1400 eV |
Now |
10.0.1 |
U10 |
Photoemission of highly correlated materials; high-resolution
atomic, molecular, and optical physics |
17-340 eV |
Now |
10.3.1 |
Bend |
X-ray fluorescence microprobe |
3-20 keV |
Now |
10.3.2 |
Bend |
Environmental and materials science, micro x-ray absorption
spectroscopy |
2.5-17 keV |
Now |
11.0.2 |
EPU5 |
Molecular environmental science |
75-2000 eV |
2002 |
11.3.1 |
Bend |
Small-Molecule Crystallography |
6-17 keV |
2002 |
11.3.2 |
Bend |
Inspection of EUV lithography masks |
50-1000 eV |
Now |
12.0.1 |
U8 |
EUV Optics Testing and Interferometry, Angle- and Spin-Resolved
Photoemission |
60-320 eV |
Now |
12.2.2 |
Superbend |
California High-Pressure Science Observatory (Calipso) |
6-40 keV |
2002 |
12.3.1 |
Superbend |
Multiple-wavelength anomalous diffraction (MAD) protein
crystallography and small-angle x-ray scattering (SAXS) |
6-18 keV |
2002 |
BTF |
Linac |
Beam Test Facility |
50-MeV electrons |
Now |