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Beamline 11.3.2

Inspection of EUV Lithography Masks

Operational

Now

Source characteristics

Bend magnet

Energy range

50-1000 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

1011 photons/s/0.01%BW at 100 eV

Resolving power (E/DE)

7000

Endstations

Scanning bright field and dark field mask inspection

Spot size at sample

2.5 x 4 µm

Local contacts

Name: Moonsuk Yi
Phone: (510) 486-4954
Email: msyi@lbl.gov

Spokespersons

Name: Jeffrey Bokor
Affiliation: Univ. of California, Berkeley; Center for X-Ray Optics, Berkeley Lab
Phone: (510) 642-4134
Fax: (510) 642-2739
Email: jbokor@eecs.berkeley.edu

Beamline Phone Number

(510) 495-2117

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