Programme

P.8 -- Poster, NCTP-43

Date: Tuesday, 31 July 2018

Time: 08:30 - 10:00

The role of electron-electron repulsion to the nonsequential double ionization mechanisms

Vinh N. T. Pham (1), Thu D. H. Truong (2)

(1) Ho Chi Minh University of Eduction (2) Ho Chi Minh University of Science

By using the classical three-dimensional ensemble model, we investigate the contribution of final state electron-electron repulsion to the mechanisms of nonsequential double ionization process of helium induced by an $800$-nm laser pulse at $3.5\times10^{14} W/cm^2$ and $4.5\times10^{14} W/cm^2$. The double ionization mechanisms and their dynamics are comprehensively presented in this study. Then the role of electron-electron repulsion for each mechanism is deeply classified. The results indicate that the electron-electron repulsion is consistently vital in recollision-induced excitation with subsequential ionization and direct ionization mechanisms. While for exchanging-state mechanisms, its contribution gradually emerges as the laser intensity increases.

Presenter: Pham Nguyen Thanh Vinh

Presentation file: